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Ultra-High Vacuum Ion Beam Laser Pulse Deposition System



Model: Peva-600E
Manufacturer: Kaibo, Taiwan
Technical Specifications：

  • Maximum vacuum: 5E-10Torr
  • Equipped with process gases: Ar, N2, O2
  • Maximum substrate temperature: 750°C
  • Laser wavelength: 248 nm
  • Operational control: it is equipped with software operating system, deposition program can be compiled, and manual and automatic process can be selected.

Features and Applications：
The equipment includes magnetron sputtering deposition, ion beam sputtering deposition, pulsed laser deposition and ion beam assisted sputtering, which allow to grow various high quality optic, electrical and semiconducting films.