Plasma Etching and Deposition System

Manufacturer: Shenyang Scientific Instrument Development Center Co., Ltd.
Technical Specifications：

• Maximum vacuum: 5E-4Pa
• Equipped with process gases: CH4, H2, Ar
• Sample table diameter: 134 mm, rotational speed 1-10 rpm, up and down stroke 90 mm
• Power: 10 kW, maximum current: 200 A

Features and Applications：

It is mainly used to prepare carbon-based film materials, including diamond films and diamond-like films.